Physics and Technology of High-k Gate Dielectrics 4
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Physics and Technology of High-k Gate Dielectrics 4

Samares Kar2006
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This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.